The Investigation of the Effect Of Thickness On The Properties of Titanium Films Created by the Process of DC Magnetron Sputtering

The aim of this study is to investigate the effect of increasing the thickness on the properties of titanium films created on AISI 316L stainless steel substrate by using the process of DC magnetron sputtering. To achieve this, deposition operation in various times 5, 10, 15 and 20 minutes were set to films with different thicknesses to create. The thickness of titanium films by using profilometery were measured. The morphology of films by field emission scanning electron microscope (FESEM) were investigated and titanium nanoparticles average size were determined. The topography of titanium films by using atomic force microscope (AFM) were investigated and the amount of average surface roughness of films were determined. In addition, corrosion resistance the thickest of created titanium film by potentiodynamic polarization test in SBF physiological solution at 37ºC temperature was evaluated and the values of corrosion potential and the corrosion current density were determined. The results of these tests showed that the titanium film with a thickness of 298 nm has the most dence and the most uniform structure and the highest amounts of titanium nanoparticles average size (65 nm) and the average surface roughness (3.767 nm). Also creating titanium film with a thickness of 298 nm on AISI 316L stainless steel increases the corrosion potential from -0.313 to -0.279 V and reduced corrosion current density from 451.1 to 163.4 nA/cm2 which resulted to improve corrosion resistance.