Studying production of suitable glass polisher with compounds of silica, silicon carbide and cerium oxide

Cerium based abrasives were studied for polishing glass surface. Raw materials used were Microsilica, Nanosilica, Silicon carbide, Cerium Oxide and Sodium Metasilicate. The procedure of powder processing was employed. Firing temperature 750ºC and 950 ºC were applied. Samples were prepared and firing temperature and strength was compared. Microscopy investigation and Image Analyzer revealed microstructure and grian distribution. XRD studies showed phases such as Ce2Si2O7, SiC and Na6Si8O19 From some reaction of CeO2 and SiO2.Then, values of density, percent by weight, volume of water absorption and the weight difference in grinding testwere measured. Finally the best composition was selected as sodium Metasilicate, Nanosilica, Silicon carbide and Cerium oxide and firing temperature of 950ºC, so that a suitable polishe for glass could be obtained.