Characterization of Sputtered NiTi Shape Memory Alloy Thin Films

During recent years, many investigations have been carried out to determine how to select di erent materials for the making of Micro Electro Mechanical Systems (MEMS) and bio-MEMS. The NiTi shape memory alloy thin lm has been much regarded as a promising candidate for MEMS due to its unique shape memory e ect and high energy output. In this research, NiTi thin lm was fabricated using a sputtering technique from separate elemental Ni and Ti targets. The characterizations of the deposited lms were investigated using di erent analysis techniques, such as Field Emission SEM, DSC, XRD, electrical resistivity measurement and nanoindentation. Keywords: NiTi thin lm; Sputtering; Characterization; Shape memory e ect.