bearing area
در نشریات گروه مواد و متالورژی-
The purpose of this article is to fabricate Cu-Ni nanoparticles of different sizes to investigate the morphology and structural properties of these nanoparticles. Cu-Ni nanoparticles with different nickel layer thicknesses were deposited with capacitive capacitance using a radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system. The 15 nm thick Ni films have a phase shift of about 25 nm compared to the other films, indicating that the films are firstly very smooth and secondly capable of phase change. Cu NPs without Ni, Cu NPs with 5 nm of Ni and 10 nm of Ni have cavity coverage of less than 5% and layer content of about 90% and 95% which are monolayer heights. Increasing the thickness of nickel affects the index of absorption coefficient of Cu-Ni thin films.Keywords: Ni layer thicknesses, Morphology, Bearing Area, Absorption coefficient
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Topological characterizations and optical density of the synthesized hydrogenated amorphous carbon Cu-Ni NPs @ a-C: H nanotubes (CNTs) with different surface morphology were studied in this report. Films deposited with Ni layer thickness of5 nm have a maximum value of optical density especially in high energy range. Steps between 1800 to 2000KeV in the Rutherford backscattering (RBS) spectra are correspond to the presence of Cu and Ni elements. The thicknesses of films were measured by using SIMN-RA software. Films deposited with Ni layer thickness of 15nm have a maximum value of the lateral size of nanotubes in about 19.7nm.The grown CNTs of films deposited with Ni layer thickness15nm Ni, has a maximum value of diameter in about 16.2nm. The diagram of bearing area proportion height shows the percentage of cavities and single-layers. The cavity coverage of films was less than 5% and the layer content of films was about 90%.Keywords: Topography, Bearing Area, Nanotubes lateral size, Fractal dimensions, Optical Density
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لایه های مختلف اکسید روی و اکسید روی تزریق شده با آلومینیوم با استفاده از روش کندوپاش مغناطیسی با فرکانس رادیویی در دمای اتاق بر روی لایه های شیشه ای ساخته شدند. لایه ها در یک کوره الکتریکی با حضور گاز آرگون در سه دمای مختلف 400، 500 و 600 درجه سانتی بازپخت شدند. مقدار چگالی اپتیکی اکسید روی نسبت به اکسید روی تزریق شده با آلومینیوم بیشتر است. مقادیر اندازه عرضی نانو ذرات برای لایه های اکسید روی با افزایش دمای بازپخت، افزایش یافتند. لایه های اکسید روی بازپخت شده در دمای 400 درجه سانتی گراد دارای کمترین مقدار اندازه عرضی نانو ذرات در حدود 59/22 نانومتر هستند. لایه های اکسید روی تزریق شده با آلومینیوم و بازپخت شده در دمای 600 درجه سانتی گراد دارای بیشترین مقدار اندازه عرضی نانو ذرات در حدود 41/34 نانومتر هستند. تغییرات ارتفاع سطح روبش شده لایه ها نشان دادند که لایه اکسید روی در دمای اتاق دارای یک جهش تند 25 نانومتر می باشد. همچنین لایه اکسید روی تزریق شده با آلومینیوم در دمای 600 درجه سانتی گراد دارای فراز و نشیب کمتری نسبت به بقیه دماها دارا می باشد و ارتفاع حول 6 نانومتر است. باافزایش دمای بازپخت مقادیر ابعاد فراکتالی لایه های اکسید روی کاهش می یابد.
کلید واژگان: ابعاد فراکتال، خواص ساختاری، اندازه عرضی نانو ذرات، توپوگرافی سطح لایه ها، چگالی اپتیکی، منطقه تحملThe ZnO films and ZnO films doped with Al were deposited on glass substrates by radio frequency magnetron sputtering at room temperature. Films were annealed in an electrical furnace with Ar atmosphere at three different temperatures 400, 500, and 600 oC. The values of optical density of ZnO films were greater than respect to ZnO films doped with Al. With increasing annealing temperature, the lateral size values of nanoparticles for ZnO films were increased. The ZnO films annealed at 400 ⁰C have minimum value of the nanoparticles lateral size in about of 22.59 nm. The ZnO films doped with Al and annealed at 600 ⁰C have maximum value of the nanoparticles lateral size in about of 22.59 nm. Changes in the height of the scanned surface of the layers indicated that the zinc oxide film has a sharp jump of 25nm at room temperature. Also, the ZnO films doped with aluminum at 600 °C have less ups and downs than other temperatures and the height is around 6 nm. With increasing the annealing temperature, the fractal dimensions’ values of the zinc oxide films were decreased.
Keywords: fractal dimension, structural properties, lateral size, optical density, bearing area -
In this paper, CAZO and CZO thin films were deposited on quartz substrates by radio frequency magnetic sputtering and annealed at different temperatures of 400, 500, and 600°C. One of the most structural studies of thin-film materials is the analysis of the results that are obtained from AFM images. The most variations in optical density of CZO and CAZO thin films were at energy points to about 3eV and 4eV, respectively. Fractal dimensions and structural properties of films, as well as the optical density of CZO and CAZO thin films, were investigated. The AFM images were used to estimate the lateral size of the nanoparticles on the surface of the films. Annealed films at 500°Chad the maximum values for the lateral size of the nanoparticles. These values for the as-deposited films and annealed films at different temperatures of 400, 500, and 600°C were about 7.9,8.1, 6.5, and 7.75nm for CZO thin films, respectively. In addition, the lateral size of CAZO thin films was about 6.8, 6.27, 6.04, and 6.71, respectively. Films that annealed at 500°Chad the minimum value of fractal dimensions. The power spectral density of all films reflects the inverse power low variations, especially in the high spatial frequency region, indicating the presence of fractal components in prominent topographies. The maximum variations in the bearing area were as much as 0.015μm and 0.01μm for CZO thin films and CAZO thin films, respectively.Keywords: The CAZO Thin Films, Fractal dimensions, Topography, Optical Density, Bearing Area
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