fractal dimensions

In this study, Cu and Cu-Co films were prepared using DC Magnetron sputtering system on silicon substrates. Any increase in the roughness and thickness of films would intensify the scattering of the sputtered atoms and consequently, the atoms would lose enough time to find the lowest energy required by each nanoparticle (NP). The height changes on the surface of the scanned films are indicative of the topological phase of the films. According to the results, the films were not smooth that made them undergo a second phase change. The address layer and thickness changes did not have much effect on the degree of isolation. For this reason, the graphs demonstrated close and identical results. All samples display strong light absorption over the entire spectral range, suggesting that they could bide all light-absorber materials. At the peak of approximately 2.7, the cross-point of d(⍺hν)/d(hν) curves yielded optical band gap (Eg) values of 2.68 eV, 2.76 eV, 2.85 eV, and 2.73 eV corresponding to the Samples 1 to 4, respectively. The optical conductivity of the films increased upon increasing the energy. The SEM images confirmed that the obtained cobalt nanocrystals was approximately spherical in shape with an average diameter less than 80 nm.

Topological characterizations and optical density of the synthesized hydrogenated amorphous carbon Cu-Ni NPs @ a-C: H nanotubes (CNTs) with different surface morphology were studied in this report. Films deposited with Ni layer thickness of5 nm have a maximum value of optical density especially in high energy range. Steps between 1800 to 2000KeV in the Rutherford backscattering (RBS) spectra are correspond to the presence of Cu and Ni elements. The thicknesses of films were measured by using SIMN-RA software. Films deposited with Ni layer thickness of 15nm have a maximum value of the lateral size of nanotubes in about 19.7nm.The grown CNTs of films deposited with Ni layer thickness15nm Ni, has a maximum value of diameter in about 16.2nm. The diagram of bearing area proportion height shows the percentage of cavities and single-layers. The cavity coverage of films was less than 5% and the layer content of films was about 90%.

In this paper, CAZO and CZO thin films were deposited on quartz substrates by radio frequency magnetic sputtering and annealed at different temperatures of 400, 500, and 600°C. One of the most structural studies of thin-film materials is the analysis of the results that are obtained from AFM images. The most variations in optical density of CZO and CAZO thin films were at energy points to about 3eV and 4eV, respectively. Fractal dimensions and structural properties of films, as well as the optical density of CZO and CAZO thin films, were investigated. The AFM images were used to estimate the lateral size of the nanoparticles on the surface of the films. Annealed films at 500°Chad the maximum values for the lateral size of the nanoparticles. These values for the as-deposited films and annealed films at different temperatures of 400, 500, and 600°C were about 7.9,8.1, 6.5, and 7.75nm for CZO thin films, respectively. In addition, the lateral size of CAZO thin films was about 6.8, 6.27, 6.04, and 6.71, respectively. Films that annealed at 500°Chad the minimum value of fractal dimensions. The power spectral density of all films reflects the inverse power low variations, especially in the high spatial frequency region, indicating the presence of fractal components in prominent topographies. The maximum variations in the bearing area were as much as 0.015μm and 0.01μm for CZO thin films and CAZO thin films, respectively.