Investigation of the effect of deposition time on the properties of created titanium films by PVD method

The aim of this study is to investigate the effect of increasing deposition time and thus increasing thickness on the properties of created titanium films on 316L stainless steel substrate by using physical vapor deposition (PVD) method. To achieve this, deposition operation in various duration times of 5, 10, 15 and 20 minutes were set to obtain films with different thicknesses. Then, thickness of the titanium films were measured by using the profilometer set up and their chemical composition were determined by energy dispersive X-ray (EDX) technique. morphology of the films were investigated by using field emission scanning electron microscopy (FESEM) and their topography by atomic force microscopy (AFM). Structure of the titanium films were determined by using X-ray diffraction (XRD) technique and their adhesion strength to substrate were investigated by heat and quench quality test. The results of these tests showed that by increasing deposition time, thickness of titanium films increases from 88 nm to 298 nm. Average titanium particles size increased from 12 nm to 65 nm and structure becames more dense and uniform. Average surface roughness of titanium films increased from 2.108 nm to 3.767 nm. Titanium films had a preferred orientation of (002) and showed good adhesion strength to the substrate.