Characterization and fabrication by combination of plasma sputtering and thermal oxidation electro - optical thin film ZnO:Al

The int erest in dusty plasma research, which is a relatively new field in plasma physics, has increased with the development of m icroelectronics. The dust particles appear as pollutant in this industrial processing. Recent ly, however, they are seen from a different point of views – they can be useful in coatings various technologies for m icroelectronic, optic, electro-opt ic industrial. In this investigation we have concent rated on coating of dust particles by ZnO:Al thin film. D ust particles in the investigation are Zn, Al. Thin films are fabrication by Combination of Plasma Sputtering Zn, Al and T hermal Oxidation. T hese thin films have special physical properties, such as large bond strength, ZnO thin films exhibit high transparency in visible region and low electrical resistively. T he electrical and optical properties of ZnO:Al thin films were evaluated by XRD, RBS, the linear four point probe method and visible spectroscopy. T he best electrical properties obtain and the transparent in 300-800 nm wavelengths is 85 percent.