Constructio n of a hot cathode plasma source for ion beam sputter deposition

In this research, a hot cathode plasma source was designed and constructed for a 5-centimeter diameter ion beam source. The ion source can be used in ion beam sputter deposition applications. The plasma formation in high vacuum regime (in a range from 10-3 to 10-4 mbar) was studied by applying magnetic field using permanent magnets assembly. Effect of various control parameters such as working pressure, discharge voltage and external electron source (hot tungsten filament) on plasma density were investigated. Under discharge voltage of 57 volt, magnetic field of about 200 Gauss and filament current of 18 ampere, the maximum discharge current of 130 miliampere was obtained at a pressure of 1.2×10-4 mbar.