Prepration of silver chip silanized by 3- Aminopropyltriethoxysilane for Surface Plasmon Resonance sensors

The aim of this work was the optimization of annealing time of silver chip silanized by aminopropyl try ethoxy silane. Silver chip with 50 nm thickness silanized by aqueous silane was annealed in different time at 100 °C. Silanized chips were analyzed via AFM, surface Plasmon resonance sensor and contact angle measurement. Result chips had good optical property for surface Plasmon resonance sensors. By increasing the annealing time, the roughness and chemical stability of silanized chips increased, while their surface plasmon resonance response weakened. Also, annealing increased amine accessibility of chips.