Growth Optimization of Uniform Zinc Oxide Nanorods on Seeded Silicon Substrate Using Chemical Bath Deposition

Vertical and uniform zinc oxide (ZnO) nanorods were grown on seeded silicon substrate using chemical bath deposition (CBD) technique. A ZnO thin film was sputtered on Si substrate to be used as a seed layer. The effects of growth temperature and time on morphology and structural properties of ZnO nanorods were investigated using scanning electron microscopy (SEM) and X-ray diffractometry (XRD). The results showed that ZnO seed layer acts an important role for uniformity of synthesized nanorods. Furthermore, uniform and vertical nanorods can be grown on silicon substrates by optimization of growth parameters. The ZnO nanorods which were grown using this technique can show improved structural properties without post-deposition thermal treatments. Due to the compatibility of silicon with electronic devices, ZnO nanostructures based on seeded silicon can be widely used in optoelectronic industries.