A Review on Introduction and Production Process of Porous Silicon

In this paper, a powerful explosive system has been introduced where in porous silicon, as host matrix, is acceptor of different oxidizers. To produce porous silicon and prepare the surface, an electro-chemical etching was presented and then to prepare the related composites,the obtained product was processed. In this process, silicon single-crystal wafer as anode is electrochemically oxidized to form the porous silicon. The oxidation process depends on the parameters such as resistance, the electrolyte composition, crystallography orientation, temperature and current density. In during of the reaction, the system in proximity of HF is converted to and: Si + 2H+ + 6HF SiF62- + 2H2 + 4H+In the next stage, the produced pores by particular ways are filled with oxidizer agents that will change obtained product explosion properties depending on the filler type. In these cases, nitrate and perchlorate salts are usually used as oxidizer constituents. The obtained products have favorite mechanical stability, combust in normal and controllable ways and have long- time life.The performance energy and the obtained reaction rate are predictable and repeatable.The maximum energy release is 28 KJ/gr for this explosion and combustion temperature range was between 2900 K and 4100 K.