Optimisotion of Alumina coating on inconol 738 substrates by electrolhoretic deposition process

Electrophoretic deposition has been used by establishing an electric field in a stable suspension, a perfectly smooth and uniform surface is obtained. In this study a coating is applied on a Inconel substrate by the ionizations of alumina single crystals in a suspension and in an electric field. Then, with sintering treatment, a dense coating is obtained. The effect of time, applied voltage, processing, sintering temperature, and the pH of the solution on the thickness of deposited layer are also investigated. To determine the thickness and analysis of coating layer, scanning electron microscopy was used.It was found that by increasing voltage, applied current, sintering temperature and also applying optimum processing of sintering treatment and increasing pH, the thickness of deposited layer was increased. Each of the mentioned factors had different effects on the thickness of coating layer. With due attention to the effective factors on the thickness of the deposited layer, optimum conditions for applying coating was achieved.