Design of Magnetic Structure of a Magnetron Sputtering Cathode by Magnetic Field Simulation and Investigation of Deposition Rate

A new design for magnetic structure of a circular planar magnetron sputtering cathode has been proposed through optimizing the configuration of its magnetic components by means of finite element software، “ANSYS”. In this design، magnetic flux lines were collimated in a wide region above the target surface by setting lateral magnet oblique with respect to target surface and by applying a shunt below the target. In addition، according to this design، a cathode was fabricated and its operational parameters were measured. At a pressure of 50 mTorr and a dc power of 1kw، we obtained 56% and 16 nm/s for target utilization and deposition rate respectively، as the most important parameters.