مجله دانش آزمایشگاهی ایران
سال دوم شماره 2 (پیاپی 6، تابستان 1393)

Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles usually uses an inert gas plasma, mainly Argon. So the target will be eroded. The sputtering process is commonly utilized for sample preparation in scanning electron microscopy .By this method the conductive coating would prevent sample charging and increases the electrical conductivitythat is one of the most important factors on the improvement of the image resolution.

Recently significant developments of chromatography column construction making technology, system optimization, detector design and data processing, have brought the individual achievements in chromatographic performance. Ultra performance liquid chromatography (UPLC) is a new category of analytical separation science that retains principles of high performance liquid chromatography (HPLC), while increasing speed, sensitivity and resolution. Using fine particles (less than 2.5 μm) decreases the length of column, save times and reduces solvent consumption.

Transmission electron microscopy (TEM) is a powerful tool for the investigation of the microstructure of materials, providing crystallographic information and composition at the nanometer scale.So, samples should be transparent to the electron beam. This article has been provided in two parts. In first part TEM sample preparation techniques for different classes of metals, alloys and multilayered coatings are discussed. The second part, describes TEM sample preparation techniques for nanomaterials and composites with illustrative examples. Also, site-specific TEM specimen preparation using focused ion beam (FIB) milling will be presented in part 2.