Preparation of Ag-doped ZnS thin films by RF magnetron sputtering

In this paper, Ag-doped ZnS thin films were deposited on glass substrates using radio frequency (RF) magnetron sputtering at room temperature. In order to optimization thin films, the samples deposited at various sputtering pressures (1.5×10-3 - 1×10-1 torr). The structure and surface morphology of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM) and scanning electron microscopy (SEM). Atomic absorption spectroscopy (AAS) and X-Ray microprobe analyzer (XPMA) were also employed. Findings showed that high-quality ZnS:Ag thin films with uniform morphology and chemical composition have been grown at 5×10-2 torr.