Effect of different thickness Ni Layers on morphology and structural properties of Cu-Ni thin Films

The purpose of this article is to fabricate Cu-Ni nanoparticles of different sizes to investigate the morphology and structural properties of these nanoparticles. Cu-Ni nanoparticles with different nickel layer thicknesses were deposited with capacitive capacitance using a radio frequency plasma enhanced chemical vapor deposition (RF-PECVD) system. The 15 nm thick Ni films have a phase shift of about 25 nm compared to the other films, indicating that the films are firstly very smooth and secondly capable of phase change. Cu NPs without Ni, Cu NPs with 5 nm of Ni and 10 nm of Ni have cavity coverage of less than 5% and layer content of about 90% and 95% which are monolayer heights. Increasing the thickness of nickel affects the index of absorption coefficient of Cu-Ni thin films.