Comparative modeling and simulation of plasma produced by microwaves with different input powers

Plasma technology is used in many countries in various fields such as ozone production, surface treatment, surface modification, medicine, etc. Plasma generated with microwave-like waves is a promising and interesting technology for its unique and versatile properties. These characteristics of microwave plasma make it an alternative technology compared to traditional thermal chemical reactors, provided that its specific technical challenges are met. In this numerical study, the properties of microwave plasma with a frequency of 2.45 GHz and argon gas at atmospheric pressure were investigated. By varying the input power of the device in the range of 10 W to 20 W in magnetic mode and mode (TM), the comparative profiles of electron density, electron temperature, electric field are shown. The simulation results show the production of chemical elements in microwave plasma. High-energy electrons and electron density are considered as the main factors affecting the properties of microwave plasma.