The effect of laser parameters (frequency and fluency) on the optical and structural characteristics of ZnO films deposited by PLD method

The pulsed laser deposition is a practical synthesis route because of its unique advantages in growing various materials. Furthermore, the quality of thin films depends on different parameters in the deposition process. Meanwhile, ZnO has many applications in manufacturing optics, electronics, and optoelectronics instruments because of its exclusive properties. We have set up a PLD array to deposit the ZnO thin films on glass substrates. This study investigates the structural and optical characteristics of the films deposited at two different pulse repetition rates. Based on the optical-microscopic images and the scanning electron microscope (SEM) micrographs of films, increasing pulse repetition rate increases the uniformity of the particle size distribution and enhances film thickness. Also, the optical characterization performed by UV-Visible spectroscopy shows that the absorption and transmission rate, bandgap energy, and crystalline quality of the films can adjust by tuning the pulse repetition rate.