Sputtering and its effects on SEM sample preparation
Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles usually uses an inert gas plasma, mainly Argon. So the target will be eroded. The sputtering process is commonly utilized for sample preparation in scanning electron microscopy .By this method the conductive coating would prevent sample charging and increases the electrical conductivitythat is one of the most important factors on the improvement of the image resolution.
SEM , Sample preparation , Sputtering , Plasma , Target , Coating
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